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Characteristics and Application of Tantalum Pentoxide (Ta2O5)Nanopowder

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Characteristics and Application of Tantalum Pentoxide (Ta2O5)Nanopowder

  • February 4,2024.

Tantalum pentoxide nanopowder (Ta2O5 HW-T502) is the material with special properties and potential applications, possessing the following characteristics:

Small particle size: the particle size of Ta2O5 nano powder is usually at the nanometer level (tens to hundreds of nanometers), with large specific surface area and high specific surface to volume ratio, which is conducive to its unique performance in various applications.

High surface activity: Ta2O5 nano powder has a larger surface area, providing more active surfaces that facilitate interaction with other substances, thereby expanding its application areas.

High temperature stability: Ta2O5 has excellent high-temperature stability and corrosion resistance, which can maintain good performance and structural stability in high-temperature environments. It makes Ta2O5 nano powder widely used in high-temperature processes and devices.

Electrical performance: Ta2O5 has a high dielectric constant and low dielectric loss, making it have good potential for application in electrical devices.

Optical performance: Ta2O5 nano powder has high refractive index and transparency in visible and ultraviolet light regions, as well as excellent optical absorption and fluorescence characteristics, so it can be used in optical coatings, optical devices, optical sensors and other applications.

At the same time, ceramic targets based on Ta2O5 nano powder can be used in film deposition, optical coating, optoelectronic device preparation and other fields. By controlling the preparation and processing process of nano powder, ceramic materials with high purity, uniformity and controllability can be obtained. The following are some applications of Ta2O5 nano powder as ceramic targets:

Semiconductor technology: Ta2O5 is widely used in thin film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD) in semiconductor technology. By applying high-energy particle beams or high-temperature reaction gases to the target material, tantalum oxide can be deposited on the substrate to form the thin films, which have good dielectric properties and barrier layer functions in semiconductor devices.

Optical coating: Due to its excellent refractive index and transmittance characteristics, tantalum oxide can be used in the field of optical coatings. Ta2O5 thin films can be used to prepare optical devices such as mirrors, transparent conductive films, and optical filters.

Solar cells: Ta2O5 can be used to prepare transparent conductive layers in solar cells. By depositing laser structured tantalum oxide thin films on transparent conductive layers, the light absorption and electron transfer efficiency of solar cells can be improved.

Anti-reflective coating: Ta2O5 thin film can be used to prepare anti reflective coatings to reduce the reflection loss of light on the surface of optical components. These coatings are widely used in fields such as optical instruments, optical devices, and display screens.

Hongwu Nano supplies Ta2O5 powder at 100-150nm, and the particle size can be adjusted. Welcome to send inquiry to us if you’re interested in our Ta2O5nanopowder.


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